As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. Vivek Yadav, an engineering manager from ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Design patterns have a wide variety of applications in the design, verification and test flows of IC development. From significantly reducing rule deck complexity to simplifying the task of avoiding ...

Introduced with the Java 17 release, pattern matching enhances the instanceof operator so Java developers can better check and object's type and extract its components, and more efficiently deal with ...

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

Take advantage of pattern matching improvements in C# 8.0 to write code that is more readable, maintainable, and efficient Pattern matching is an excellent feature that was introduced in C# 7. You can ...

Take advantage of the new relational and logical patterns in C# 9.0 to make your code more readable, maintainable, and efficient. Pattern matching is a great feature first introduced in C# 7. You can ...