Detecting macro-defects early in the wafer processing flow is vital for yield and process improvement, and it is driving innovations in both inspection techniques and wafer test map analysis. At the ...
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Image-based model enhances the detection of surface defects in low-light industrial settings
In industry, the detection of anomalies such as scratches, dents, and discolorations is crucial to ensure product quality and safety. However, conventional methods rely on heavy computational ...
Reducing defects on the wafer edge, bevel, and backside is becoming essential as the complexity of developing leading-edge chips continue to increase, and where a single flaw can have costly ...
Graphene and hexagonal Boron Nitride possesses exceptional chemical and physical properties. Recent experimental results ...
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