Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
A new technical paper titled “Are LLMs Any Good for High-Level Synthesis?” was published by researchers at University of Arizona. Abstract “The increasing complexity and demand for faster, ...
High-Level Synthesis (HLS) has emerged as a pivotal technology in the transformation of algorithmic descriptions into efficient hardware designs. Coupled with Design Space Exploration (DSE), HLS ...
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